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Comparison of techniques to characterise the density, porosity and elastic modulus of porous low-K SiO2 xerogel films

dc.contributor.authorMurray, C.
dc.contributor.authorFlannery, C.
dc.contributor.authorStreiter, I.
dc.contributor.authorSchulz, S. E.
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorMogilnikov, K. P.
dc.contributor.authorHimcinschi, C.
dc.contributor.authorFriedrich, M.
dc.contributor.authorZahn, D. R. T.
dc.contributor.authorGessner, T.
dc.date.accessioned2021-10-14T22:29:51Z
dc.date.available2021-10-14T22:29:51Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6632
dc.sourceIIOimport
dc.titleComparison of techniques to characterise the density, porosity and elastic modulus of porous low-K SiO2 xerogel films
dc.typeJournal article
dc.source.peerreviewno
dc.source.beginpage133
dc.source.endpage141
dc.source.journalMicroelectronic Engineering
dc.source.issue1_2
dc.source.volume60
imec.availabilityPublished - imec
imec.internalnotes5th Workshop on Materials for Advanced Metallization. March 2001; Sigtuna, Sweden


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