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Comparison of techniques to characterise the density, porosity and elastic modulus of porous low-K SiO2 xerogel films
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Authors
Murray, C.
;
Flannery, C.
;
Streiter, I.
;
Schulz, S. E.
;
Baklanov, Mikhaïl
;
Mogilnikov, K. P.
;
Himcinschi, C.
;
Friedrich, M.
;
Zahn, D. R. T.
;
Gessner, T.
Issue
1_2
Journal
Microelectronic Engineering
Volume
60
Title
Comparison of techniques to characterise the density, porosity and elastic modulus of porous low-K SiO2 xerogel films
Publication type
Journal article
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