Publication:
Comparison of techniques to characterise the density, porosity and elastic modulus of porous low-K SiO2 xerogel films
Date
| dc.contributor.author | Murray, C. | |
| dc.contributor.author | Flannery, C. | |
| dc.contributor.author | Streiter, I. | |
| dc.contributor.author | Schulz, S. E. | |
| dc.contributor.author | Baklanov, Mikhaïl | |
| dc.contributor.author | Mogilnikov, K. P. | |
| dc.contributor.author | Himcinschi, C. | |
| dc.contributor.author | Friedrich, M. | |
| dc.contributor.author | Zahn, D. R. T. | |
| dc.contributor.author | Gessner, T. | |
| dc.date.accessioned | 2021-10-14T22:29:51Z | |
| dc.date.available | 2021-10-14T22:29:51Z | |
| dc.date.issued | 2002 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/6632 | |
| dc.source.beginpage | 133 | |
| dc.source.endpage | 141 | |
| dc.source.issue | 1_2 | |
| dc.source.journal | Microelectronic Engineering | |
| dc.source.volume | 60 | |
| dc.title | Comparison of techniques to characterise the density, porosity and elastic modulus of porous low-K SiO2 xerogel films | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
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