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Advanced single chemistry alkaline cleaning in a STEAG single tank tool

dc.contributor.authorOnsia, Bart
dc.contributor.authorSchellkes, E.
dc.contributor.authorVos, Rita
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorDoll, O.
dc.contributor.authorFester, A.
dc.contributor.authorKolbesen, B.
dc.contributor.authorHoffman, M.
dc.contributor.authorHatcher, Z.
dc.contributor.authorWolke, K.
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-14T22:39:03Z
dc.date.available2021-10-14T22:39:03Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6678
dc.sourceIIOimport
dc.titleAdvanced single chemistry alkaline cleaning in a STEAG single tank tool
dc.typeProceedings paper
dc.contributor.imecauthorOnsia, Bart
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage23
dc.source.endpage30
dc.source.conferenceCleaning Technology in Semiconductor Device Manufacturing VII
dc.source.conferencedate4/09/2001
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - open access
imec.internalnotesElectrochemical Society Proceedings; Vol. 2001-26


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