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Hydrogen plasma-enhanced thermal donor formation in n-type oxygen-doped high-resistivity float-zone silicon

dc.contributor.authorSimoen, Eddy
dc.contributor.authorClaeys, Cor
dc.contributor.authorJob, R.
dc.contributor.authorUlyashin, A.G.
dc.contributor.authorFahrner, W.R.
dc.contributor.authorDe Gryse, O.
dc.contributor.authorClauws, P.
dc.date.accessioned2021-10-14T23:10:58Z
dc.date.available2021-10-14T23:10:58Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6830
dc.sourceIIOimport
dc.titleHydrogen plasma-enhanced thermal donor formation in n-type oxygen-doped high-resistivity float-zone silicon
dc.typeJournal article
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.source.peerreviewno
dc.source.beginpage1842
dc.source.endpage1844
dc.source.journalApplied Physics Letters
dc.source.issue10
dc.source.volume81
imec.availabilityPublished - imec


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