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Etching and cleaning of HfO2 deposited on Si

dc.contributor.authorSnow, Jim
dc.contributor.authorKraus, Harald
dc.contributor.authorVan Doorne, Patrick
dc.contributor.authorMertens, Paul
dc.contributor.authorKovacs, Fredi
dc.date.accessioned2021-10-14T23:12:57Z
dc.date.available2021-10-14T23:12:57Z
dc.date.issued2002-11
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6839
dc.sourceIIOimport
dc.titleEtching and cleaning of HfO2 deposited on Si
dc.typeProceedings paper
dc.contributor.imecauthorMertens, Paul
dc.source.peerreviewno
dc.source.conferenceThe 1st International Surface Cleaning Workshop
dc.source.conferencedate11/11/2002
dc.source.conferencelocationBoston, MA USA
imec.availabilityPublished - imec


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