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Recent advancements in 157nm resist performance

dc.contributor.authorTurnquest, K.
dc.contributor.authorGraffenberg, V.
dc.contributor.authorPatel, S.
dc.contributor.authorMiller, D.
dc.contributor.authorDean, K.
dc.contributor.authorGoethals, Mieke
dc.contributor.authorVan Roey, F.
dc.contributor.authorHermans, J.
dc.contributor.authorRonse, Kurt
dc.contributor.authorWong, P.
dc.contributor.authorHansen, S.
dc.date.accessioned2021-10-14T23:25:41Z
dc.date.available2021-10-14T23:25:41Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6897
dc.sourceIIOimport
dc.titleRecent advancements in 157nm resist performance
dc.typeOral presentation
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.source.peerreviewno
dc.source.conference3rd International Symposium on 157nm Lithography
dc.source.conferencedate3/09/2002
dc.source.conferencelocationAntwerpen Belgium
imec.availabilityPublished - imec


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