Show simple item record

100nm generation contact patterning by low temperature 193nm resist reflow process

dc.contributor.authorVan Driessche, V.
dc.contributor.authorGrozev, G.
dc.contributor.authorLucas, K.
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorTzviatkov, Plamen
dc.date.accessioned2021-10-14T23:33:39Z
dc.date.available2021-10-14T23:33:39Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6933
dc.sourceIIOimport
dc.title100nm generation contact patterning by low temperature 193nm resist reflow process
dc.typeJournal article
dc.contributor.imecauthorVan Roey, Frieda
dc.source.peerreviewno
dc.source.beginpage?
dc.source.endpage?
dc.source.journalSemiconductor Fabtech
dc.source.issue16
imec.availabilityPublished - imec


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record