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Articles
100nm generation contact patterning by low temperature 193nm resist reflow process
Publication:
100nm generation contact patterning by low temperature 193nm resist reflow process
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Date
2002
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Van Driessche, V.
;
Grozev, G.
;
Lucas, K.
;
Van Roey, Frieda
;
Tzviatkov, Plamen
Journal
Semiconductor Fabtech
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2063
since deposited on 2021-10-14
1
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Acq. date: 2026-05-17
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Statistics
Views
2063
since deposited on 2021-10-14
1
last month
Acq. date: 2026-05-17
Citations