Publication:
100nm generation contact patterning by low temperature 193nm resist reflow process
Date
| dc.contributor.author | Van Driessche, V. | |
| dc.contributor.author | Grozev, G. | |
| dc.contributor.author | Lucas, K. | |
| dc.contributor.author | Van Roey, Frieda | |
| dc.contributor.author | Tzviatkov, Plamen | |
| dc.contributor.imecauthor | Van Roey, Frieda | |
| dc.date.accessioned | 2021-10-14T23:33:39Z | |
| dc.date.available | 2021-10-14T23:33:39Z | |
| dc.date.issued | 2002 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/6933 | |
| dc.source.beginpage | ? | |
| dc.source.endpage | ? | |
| dc.source.issue | 16 | |
| dc.source.journal | Semiconductor Fabtech | |
| dc.title | 100nm generation contact patterning by low temperature 193nm resist reflow process | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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