100-nm generation contact patterning by low temperature 193-nm resist reflow process

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Authors
Van Driessche, Veerle; Lucas, Kevin; Van Roey, Frieda; Grozev, Grozdan; Tzviatkov, Plamen
Conference
Advances in Resist Technology and Processing XIX
Title
100-nm generation contact patterning by low temperature 193-nm resist reflow process
Publication type
Proceedings paper
Embargo date
9999-12-31
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