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Optical proximity correction: pattern generation issues

dc.contributor.authorJonckheere, Rik
dc.contributor.authorRonse, Kurt
dc.date.accessioned2021-09-29T13:08:01Z
dc.date.available2021-09-29T13:08:01Z
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/695
dc.sourceIIOimport
dc.titleOptical proximity correction: pattern generation issues
dc.typeOral presentation
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.source.peerreviewno
dc.source.conferenceMicro and Nano Engineering; 26-29 September 1994; Aix-en-Provence, France.
dc.source.conferencelocation
imec.availabilityPublished - imec


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