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Influence of HALO implantation on analog performance and comparison between bulk, partially-depleted and fully-depleted MOSFET's

dc.contributor.authorVancaillie, L.
dc.contributor.authorKilchytska, V.
dc.contributor.authorLevacq, D.
dc.contributor.authorAdriaensen, S.
dc.contributor.authorvan Meer, Hans
dc.contributor.authorDe Meyer, Kristin
dc.contributor.authorTorrese, G.
dc.contributor.authorRaskin, J.P.
dc.contributor.authorFlandre, D.
dc.date.accessioned2021-10-14T23:40:58Z
dc.date.available2021-10-14T23:40:58Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6966
dc.sourceIIOimport
dc.titleInfluence of HALO implantation on analog performance and comparison between bulk, partially-depleted and fully-depleted MOSFET's
dc.typeProceedings paper
dc.contributor.imecauthorDe Meyer, Kristin
dc.source.peerreviewno
dc.source.beginpage161
dc.source.endpage162
dc.source.conferenceIEEE International SOI Conference
dc.source.conferencedate7/10/2002
dc.source.conferencelocationWilliamsburg, VA USA
imec.availabilityPublished - imec


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