Electron beam / DUV intra-level mix-and-match lithography for random logic 0.25 μm CMOS

dc.contributor.author	Jonckheere, Rik
dc.contributor.author	Tritchkov, Alexander
dc.contributor.author	Van Driessche, Veerle
dc.contributor.author	Van den hove, Luc
dc.date.accessioned	2021-09-29T13:08:04Z
dc.date.available	2021-09-29T13:08:04Z
dc.date.issued	1995
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/696
dc.source	IIOimport
dc.title	Electron beam / DUV intra-level mix-and-match lithography for random logic 0.25 μm CMOS
dc.type	Journal article
dc.contributor.imecauthor	Jonckheere, Rik
dc.contributor.imecauthor	Van Driessche, Veerle
dc.contributor.imecauthor	Van den hove, Luc
dc.contributor.orcidimec	Jonckheere, Rik::0000-0003-2211-9443
dc.date.embargo	9999-12-31
dc.source.peerreview	no
dc.source.beginpage	231
dc.source.endpage	234
dc.source.journal	Microelectronic Engineering
dc.source.issue	1_4
dc.source.volume	27
imec.availability	Published - imec
imec.internalnotes	Proceedings of the International Conference on Micro- and Nanofabrication. September 26-29, 1994. Davos, Switzerland.