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Electron beam / DUV intra-level mix-and-match lithography for random logic 0.25 μm CMOS

dc.contributor.authorJonckheere, Rik
dc.contributor.authorTritchkov, Alexander
dc.contributor.authorVan Driessche, Veerle
dc.contributor.authorVan den hove, Luc
dc.date.accessioned2021-09-29T13:08:04Z
dc.date.available2021-09-29T13:08:04Z
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/696
dc.sourceIIOimport
dc.titleElectron beam / DUV intra-level mix-and-match lithography for random logic 0.25 μm CMOS
dc.typeJournal article
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorVan Driessche, Veerle
dc.contributor.imecauthorVan den hove, Luc
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage231
dc.source.endpage234
dc.source.journalMicroelectronic Engineering
dc.source.issue1_4
dc.source.volume27
imec.availabilityPublished - open access
imec.internalnotesProceedings of the International Conference on Micro- and Nanofabrication. September 26-29, 1994. Davos, Switzerland.


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