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Electron beam / DUV intra-level mix-and-match lithography for random logic 0.25 μm CMOS
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Authors
Jonckheere, Rik
;
Tritchkov, Alexander
;
Van Driessche, Veerle
;
Van den hove, Luc
Issue
1_4
Journal
Microelectronic Engineering
Volume
27
Title
Electron beam / DUV intra-level mix-and-match lithography for random logic 0.25 μm CMOS
Publication type
Journal article
Embargo date
9999-12-31
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