Electron beam / DUV intra-level mix-and-match lithography for random logic 0.25 μm CMOS

View/open

669.pdf (216.9Kb)

Metadata

Show full item record

Authors

Jonckheere, Rik; Tritchkov, Alexander; Van Driessche, Veerle; Van den hove, Luc

Issue

1_4

Journal

Microelectronic Engineering

Volume

27

Title

Electron beam / DUV intra-level mix-and-match lithography for random logic 0.25 μm CMOS

Publication type

Journal article

Embargo date

9999-12-31

Collections

Articles