Publication:
Electron beam / DUV intra-level mix-and-match lithography for random logic 0.25 μm CMOS
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Acq. date: 2025-11-13
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Acq. date: 2025-11-13
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1 since deposited on 2021-09-29
Acq. date: 2025-11-13
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2011 since deposited on 2021-09-29
1last week
Acq. date: 2025-11-13
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