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Progress in 157-nm resist performance and potential

dc.contributor.authorWong, Patrick
dc.contributor.authorSinkwitz, Stephan
dc.contributor.authorHansen, Steven G.
dc.contributor.authorGoethals, Mieke
dc.contributor.authorConley, Will
dc.date.accessioned2021-10-15T00:02:59Z
dc.date.available2021-10-15T00:02:59Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7059
dc.sourceIIOimport
dc.titleProgress in 157-nm resist performance and potential
dc.typeProceedings paper
dc.contributor.imecauthorWong, Patrick
dc.contributor.orcidimecWong, Patrick::0000-0003-3605-9680
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage512
dc.source.endpage521
dc.source.conferenceAdvances in Resist Technology and Processing XIX
dc.source.conferencedate4/03/2002
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol.4690


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