dc.contributor.author | Xu, Kaidong | |
dc.contributor.author | Vos, Rita | |
dc.contributor.author | Vereecke, Guy | |
dc.contributor.author | Lux, Marcel | |
dc.contributor.author | Fyen, Wim | |
dc.contributor.author | Holsteyns, Frank | |
dc.contributor.author | Kenis, Karine | |
dc.contributor.author | Mertens, Paul | |
dc.contributor.author | Heyns, Marc | |
dc.contributor.author | Vinckier, Chris | |
dc.date.accessioned | 2021-10-15T00:04:57Z | |
dc.date.available | 2021-10-15T00:04:57Z | |
dc.date.issued | 2002 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/7067 | |
dc.source | IIOimport | |
dc.title | Correlation between haze of the wafer and particle-count on wafers: a new approach to monitor nano-sized particles | |
dc.type | Oral presentation | |
dc.contributor.imecauthor | Vos, Rita | |
dc.contributor.imecauthor | Vereecke, Guy | |
dc.contributor.imecauthor | Lux, Marcel | |
dc.contributor.imecauthor | Holsteyns, Frank | |
dc.contributor.imecauthor | Kenis, Karine | |
dc.contributor.imecauthor | Mertens, Paul | |
dc.contributor.imecauthor | Heyns, Marc | |
dc.contributor.orcidimec | Vereecke, Guy::0000-0001-9058-9338 | |
dc.source.peerreview | no | |
dc.source.conference | UCPSS - Ultra Clean Processing Technology Symposium | |
dc.source.conferencedate | 16/09/2002 | |
dc.source.conferencelocation | Oostende Belgium | |
imec.availability | Published - imec | |