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Characterization of overlay mark fidelity

dc.contributor.authorAdel, M.
dc.contributor.authorGhinovker, M.
dc.contributor.authorPoplawski, J.M.
dc.contributor.authorKassel, E.
dc.contributor.authorIzikson, P.
dc.contributor.authorPollentier, Ivan
dc.contributor.authorLeray, Philippe
dc.contributor.authorLaidler, David
dc.date.accessioned2021-10-15T03:58:34Z
dc.date.available2021-10-15T03:58:34Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7118
dc.sourceIIOimport
dc.titleCharacterization of overlay mark fidelity
dc.typeProceedings paper
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorLaidler, David
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecLaidler, David::0000-0003-4055-3366
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage437
dc.source.endpage444
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XVII
dc.source.conferencedate24/02/2003
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 5038


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