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Focused ion beam analysis of Cu/LOW-k metallization structures

dc.contributor.authorBender, Hugo
dc.date.accessioned2021-10-15T04:00:31Z
dc.date.available2021-10-15T04:00:31Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7192
dc.sourceIIOimport
dc.titleFocused ion beam analysis of Cu/LOW-k metallization structures
dc.typeProceedings paper
dc.contributor.imecauthorBender, Hugo
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage357
dc.source.endpage372
dc.source.conferenceAnalytical Techniques for Semiconductor Materials and Processes
dc.source.conferencedate27/04/2003
dc.source.conferencelocationParis France
imec.availabilityPublished - open access
imec.internalnotesElectrochemical Society Proceedings; PV 2003-03


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