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Sputter rate variations in silicon under high k dielectric films

dc.contributor.authorBenett, Joe
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorBeebe, M.
dc.contributor.authorSparks, C.
dc.contributor.authorGondran, C.
dc.date.accessioned2021-10-15T04:00:50Z
dc.date.available2021-10-15T04:00:50Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7199
dc.sourceIIOimport
dc.titleSputter rate variations in silicon under high k dielectric films
dc.typeMeeting abstract
dc.contributor.imecauthorVandervorst, Wilfried
dc.source.peerreviewno
dc.source.beginpage82
dc.source.conferenceInternational Conference on Secondary Ion Mass Spectrometry - SIMS XIV
dc.source.conferencedate14/09/2003
dc.source.conferencelocationSan Diego, CA USA
imec.availabilityPublished - imec


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