dc.contributor.author | Caymax, Matty | |
dc.contributor.author | Poortmans, Jef | |
dc.contributor.author | Van Ammel, Annemie | |
dc.contributor.author | Libezny, Milan | |
dc.contributor.author | Nijs, Johan | |
dc.contributor.author | Mertens, Robert | |
dc.date.accessioned | 2021-09-29T12:40:04Z | |
dc.date.available | 2021-09-29T12:40:04Z | |
dc.date.issued | 1994 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/71 | |
dc.source | IIOimport | |
dc.title | Low temperature selective growth of epitaxial Si and Si1-xGex layers from SiH4 and GeH4 in an ultrahigh vacuum, very low pressure chemical vapour deposition reactor: kinetics and possibilities | |
dc.type | Journal article | |
dc.contributor.imecauthor | Caymax, Matty | |
dc.contributor.imecauthor | Poortmans, Jef | |
dc.contributor.imecauthor | Van Ammel, Annemie | |
dc.contributor.imecauthor | Mertens, Robert | |
dc.contributor.orcidimec | Poortmans, Jef::0000-0003-2077-2545 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 324 | |
dc.source.endpage | 328 | |
dc.source.journal | Thin Solid Films | |
dc.source.issue | 1_2 | |
dc.source.volume | 241 | |
imec.availability | Published - open access | |
imec.internalnotes | Paper from symposium C of the E-MRS Meeting; May 1993; Strasbourg, France | |