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Microcrystalline and polycrystalline silicon films for solar cells obtained by gas-jet electron-beam PECVD method

dc.contributor.authorBilyalov, Renat
dc.contributor.authorPoortmans, Jef
dc.contributor.authorSharafutdinov, R.
dc.contributor.authorKhmel, S.
dc.contributor.authorSchukin, V.
dc.contributor.authorSemenova, O.
dc.contributor.authorFedina, L.
dc.date.accessioned2021-10-15T04:01:35Z
dc.date.available2021-10-15T04:01:35Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7215
dc.sourceIIOimport
dc.titleMicrocrystalline and polycrystalline silicon films for solar cells obtained by gas-jet electron-beam PECVD method
dc.typeJournal article
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.source.peerreviewno
dc.source.beginpage293
dc.source.endpage299
dc.source.journalIEE Proceedings - Circuits, Devices and Systems
dc.source.issue4
dc.source.volume150
imec.availabilityPublished - imec
imec.internalnotesSpecial issue: Amorphous and microcrystalline semiconductor devices


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