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Microcrystalline silicon films for solar cells obtained by gas-jet electron-beam PECVD method

dc.contributor.authorBilyalov, Renat
dc.contributor.authorPoortmans, Jef
dc.contributor.authorSharafutdinov, R.
dc.contributor.authorKhmel, S.
dc.contributor.authorShchukin, V.
dc.contributor.authorSemenova, O.
dc.contributor.authorFedina, L.
dc.contributor.authorKolesov, B.
dc.date.accessioned2021-10-15T04:01:38Z
dc.date.available2021-10-15T04:01:38Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7216
dc.sourceIIOimport
dc.titleMicrocrystalline silicon films for solar cells obtained by gas-jet electron-beam PECVD method
dc.typeProceedings paper
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.source.peerreviewno
dc.source.beginpage11/05/2003
dc.source.endpage18/05/2003
dc.source.conferenceProceedings of the 3rd World Conference on Photovoltaic Energy Conversion
dc.source.conferencedate12/05/2003
dc.source.conferencelocationOsaka Japan
imec.availabilityPublished - imec


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