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HfO2, Al2O3 and HfAlOx high-k dielectrics characterized by VUV spectroscopic ellipsometry

dc.contributor.authorBoher, P.
dc.contributor.authorDefranaoux, C.
dc.contributor.authorBender, Hugo
dc.date.accessioned2021-10-15T04:02:47Z
dc.date.available2021-10-15T04:02:47Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7235
dc.sourceIIOimport
dc.titleHfO2, Al2O3 and HfAlOx high-k dielectrics characterized by VUV spectroscopic ellipsometry
dc.typeOral presentation
dc.contributor.imecauthorBender, Hugo
dc.source.peerreviewno
dc.source.conferenceMRS Spring Meeting Symposium D: CMOS Front-End Materials and Process Technology, Materials Research Society, MRS Spring Meeting
dc.source.conferencedate21/04/2003
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - imec


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