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Mighty hight-t lithography for 65nm generation contacts

dc.contributor.authorConley, Will
dc.contributor.authorMontgomery, Patrick
dc.contributor.authorLucas, Kevin
dc.contributor.authorLitt, Lloyd C.
dc.contributor.authorMaltabes, John G.
dc.contributor.authorDieu, Laurent
dc.contributor.authorHughes, Gregory P,
dc.contributor.authorMellenthin, David L.
dc.contributor.authorSocha, Robert J.
dc.contributor.authorFanucchi, Eric L.
dc.contributor.authorVerhappen, Arjan
dc.contributor.authorWampler, Kurt E.
dc.contributor.authorYu, Linda
dc.contributor.authorSchaefer, Erika
dc.contributor.authorCassel, Shawn
dc.contributor.authorKuijten, Jan P.
dc.contributor.authorPijnenburg, Wil
dc.contributor.authorWiaux, Vincent
dc.contributor.authorVandenberghe, Geert
dc.date.accessioned2021-10-15T04:11:35Z
dc.date.available2021-10-15T04:11:35Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7344
dc.sourceIIOimport
dc.titleMighty hight-t lithography for 65nm generation contacts
dc.typeProceedings paper
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorVandenberghe, Geert
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage1210
dc.source.endpage1219
dc.source.conferenceOptical Microlithography XVI
dc.source.conferencedate23/02/2003
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 5040


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