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Evaluation of Litel's in-situ interferometer (ISI) technique for measuring projection-lens aberrations: an initial study

dc.contributor.authorDe Bisschop, Peter
dc.date.accessioned2021-10-15T04:16:27Z
dc.date.available2021-10-15T04:16:27Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7389
dc.sourceIIOimport
dc.titleEvaluation of Litel's in-situ interferometer (ISI) technique for measuring projection-lens aberrations: an initial study
dc.typeProceedings paper
dc.contributor.imecauthorDe Bisschop, Peter
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage11
dc.source.endpage23
dc.source.conferenceOptical Microlithography XVI
dc.source.conferencedate23/02/2003
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 5040


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