Initial assessment of the impact of the use of a hard pellicle on imaging
dc.contributor.author | De Bisschop, Peter | |
dc.contributor.author | Bruls, Richard | |
dc.contributor.author | Cicilia, Orlando | |
dc.contributor.author | Uitterdijk, Tammo | |
dc.contributor.author | Grenville, Andrew | |
dc.contributor.author | Kocsis, Michael | |
dc.contributor.author | Van Peski, Chris | |
dc.date.accessioned | 2021-10-15T04:16:34Z | |
dc.date.available | 2021-10-15T04:16:34Z | |
dc.date.issued | 2003 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/7390 | |
dc.source | IIOimport | |
dc.title | Initial assessment of the impact of the use of a hard pellicle on imaging | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | De Bisschop, Peter | |
dc.contributor.imecauthor | Kocsis, Michael | |
dc.source.peerreview | no | |
dc.source.conference | 4th International Symposium on 157nm Lithography | |
dc.source.conferencedate | 25/08/2003 | |
dc.source.conferencelocation | Yokohama Japan | |
imec.availability | Published - imec | |
imec.internalnotes | proceedings on CD-ROM |
Files in this item
Files | Size | Format | View |
---|---|---|---|
There are no files associated with this item. |