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Validation of vapor phase decomposition - Total reflection X-ray fluorescence spectrometry for metallic contamination analysis of Si wafers

dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorVinckier, Chris
dc.contributor.authorHellin, David
dc.date.accessioned2021-10-15T04:18:36Z
dc.date.available2021-10-15T04:18:36Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7406
dc.sourceIIOimport
dc.titleValidation of vapor phase decomposition - Total reflection X-ray fluorescence spectrometry for metallic contamination analysis of Si wafers
dc.typeOral presentation
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHellin, David
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.conferenceTotal Reflection X-Ray Spectrometry
dc.source.conferencedate14/09/2003
dc.source.conferencelocationHyogo Japan
imec.availabilityPublished - imec


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