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Structural characterization of mesoporous organosilica films for ultralow-k dielectrics

dc.contributor.authorde Theije, F.K.
dc.contributor.authorBalkenende, A.R.
dc.contributor.authorVerheyen, M.A.
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorMoguilnikov, Konstantin
dc.contributor.authorFurukawa, Y.
dc.date.accessioned2021-10-15T04:23:39Z
dc.date.available2021-10-15T04:23:39Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7449
dc.sourceIIOimport
dc.titleStructural characterization of mesoporous organosilica films for ultralow-k dielectrics
dc.typeJournal article
dc.source.peerreviewno
dc.source.beginpage4280
dc.source.endpage4289
dc.source.journalJournal of Physical Chemistry B
dc.source.issue18
dc.source.volume107
imec.availabilityPublished - imec


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