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Atomic layer deposition and remote plasma surface preparation for gate stack applications

dc.contributor.authorDelabie, Annelies
dc.contributor.authorCaymax, Matty
dc.contributor.authorBrijs, Bert
dc.contributor.authorCartier, E.
dc.contributor.authorGeenen, Luc
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorBajolet, Philippe
dc.contributor.authorMaes, Jan
dc.contributor.authorTsai, Wilman
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-15T04:28:41Z
dc.date.available2021-10-15T04:28:41Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7487
dc.sourceIIOimport
dc.titleAtomic layer deposition and remote plasma surface preparation for gate stack applications
dc.typeProceedings paper
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorMaes, Jan
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.beginpage12
dc.source.endpage15
dc.source.conferenceProceedings AVS 4th International Conference on Microelectronics and Interfaces - ICMI
dc.source.conferencedate3/03/2003
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - imec


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