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Extending ArF to the 65-nm node with full-phase lithography

dc.contributor.authorDriessen, Frank
dc.contributor.authorPierrat, C.
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorRonse, Kurt
dc.contributor.authorVan Adrichem, Paul
dc.contributor.authorLiu, H.Y.
dc.date.accessioned2021-10-15T04:34:49Z
dc.date.available2021-10-15T04:34:49Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7531
dc.sourceIIOimport
dc.titleExtending ArF to the 65-nm node with full-phase lithography
dc.typeProceedings paper
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorVan Adrichem, Paul
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage1091
dc.source.endpage1102
dc.source.conferenceOptical Microlithography XVI
dc.source.conferencedate23/02/2003
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 5040


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