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Assessing the performance of two-dimensional dopant profiling techniques

dc.contributor.authorDuhayon, Natasja
dc.contributor.authorEyben, Pierre
dc.contributor.authorFouchier, Marc
dc.contributor.authorClarysse, Trudo
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorAlvarez, David
dc.contributor.authorSchoemann, S.
dc.contributor.authorCiappa, M.
dc.contributor.authorStangoni, M.
dc.contributor.authorFichtner, W.
dc.contributor.authorFormanek, P.
dc.contributor.authorRaineri, V.
dc.contributor.authorGiannazzo, F.
dc.contributor.authorGoghero, D.
dc.contributor.authorRosenwaks, Y.
dc.contributor.authorShikler, R.
dc.contributor.authorSaraf, S.
dc.contributor.authorSadewasser, S.
dc.contributor.authorBarreau, N.
dc.contributor.authorGlatzel, T.
dc.contributor.authorVerheijen, M.
dc.contributor.authorMentink, S.A.M.
dc.contributor.authorvon Sprekelsen, M.
dc.contributor.authorMaltezopoulos, T.
dc.contributor.authorWiesendanger, R.
dc.contributor.authorHellemans, L.
dc.date.accessioned2021-10-15T04:35:32Z
dc.date.available2021-10-15T04:35:32Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7535
dc.sourceIIOimport
dc.titleAssessing the performance of two-dimensional dopant profiling techniques
dc.typeProceedings paper
dc.contributor.imecauthorDuhayon, Natasja
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorVandervorst, Wilfried
dc.source.peerreviewno
dc.source.beginpage215
dc.source.endpage226
dc.source.conferenceUltra Shallow Junctions. 7th Int. Worksh. Fabrication, Characterization and Modeling of Ultra Shallow Doping Profiles in Semic.
dc.source.conferencedate27/04/2003
dc.source.conferencelocationSanta Cruz, CA USA
imec.availabilityPublished - imec


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