Alternative post-etch polymer removal in a single-wafer platform

Thumbnail
View/open
Metadata
Show full item record
Authors
Dundas, C.; Vroom, R.; Ghekiere, John; Van Doorne, Patrick; Rink, I.; Sharp, I.; Heffernan, S.
Conference
Ultra Clean Processing of Silicon Surfaces 2002 - UCPSS
Title
Alternative post-etch polymer removal in a single-wafer platform
Publication type
Proceedings paper
Embargo date
9999-12-31
Collections