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Towards a model for the electrical contact and the sample surface for scanning spreading resistance microscopy

dc.contributor.authorEyben, Pierre
dc.contributor.authorDenis, S.
dc.contributor.authorClarysse, Trudo
dc.contributor.authorAlvarez, David
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-15T04:39:17Z
dc.date.available2021-10-15T04:39:17Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7560
dc.sourceIIOimport
dc.titleTowards a model for the electrical contact and the sample surface for scanning spreading resistance microscopy
dc.typeMeeting abstract
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorVandervorst, Wilfried
dc.source.peerreviewno
dc.source.beginpage214
dc.source.conferenceUltra Shallow Junctions. 7th Int. Worksh. Fabrication, Characterization and Modeling of Ultra Shallow Doping Profiles in Semic.
dc.source.conferencedate27/04/2003
dc.source.conferencelocationSanta Cruz, CA USA
imec.availabilityPublished - imec


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