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Assessing the resolution limits of scanning spreading resistance microscopy and scanning capacitance microscopy

dc.contributor.authorEyben, Pierre
dc.contributor.authorDuhayon, Natasja
dc.contributor.authorAlvarez, David
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-15T04:39:44Z
dc.date.available2021-10-15T04:39:44Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7563
dc.sourceIIOimport
dc.titleAssessing the resolution limits of scanning spreading resistance microscopy and scanning capacitance microscopy
dc.typeProceedings paper
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorDuhayon, Natasja
dc.contributor.imecauthorVandervorst, Wilfried
dc.source.peerreviewno
dc.source.beginpage215
dc.source.endpage226
dc.source.conferenceUltra Shallow Junctions. 7th Int. Worksh. Fabrication, Characterization and Modeling of Ultra Shallow Doping Profiles in Semic.
dc.source.conferencedate27/04/2003
dc.source.conferencelocationSanta Cruz, CA USA
imec.availabilityPublished - imec


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