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How clean is clean enough?

dc.contributor.authorMertens, Paul
dc.contributor.authorTeerlinck, Ivo
dc.contributor.authorHurd, Trace
dc.contributor.authorKenis, Karine
dc.contributor.authorSchmidt, Harald
dc.contributor.authorRotondaro, Antonio
dc.contributor.authorHall, L.
dc.contributor.authorGräf, D.
dc.contributor.authorDe Pestel, Freddy
dc.contributor.authorMeuris, Marc
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-09-29T13:10:57Z
dc.date.available2021-09-29T13:10:57Z
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/759
dc.sourceIIOimport
dc.titleHow clean is clean enough?
dc.typeProceedings paper
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage7
dc.source.conferenceProceedings of SEMICON/West 1995 Technical Seminar: Cleaning Technology for the Submicron Era
dc.source.conferencedate11/07/1995
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - open access


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