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Status of UV2 Litho project : Usable Vacuum Ultra Violet Lithography

dc.contributor.authorGoethals, Mieke
dc.contributor.authorJonckheere, Rik
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorHermans, Jan
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorEliat, Astrid
dc.contributor.authorGronheid, Roel
dc.contributor.authorRonse, Kurt
dc.contributor.authorWong, P.
dc.contributor.authorMorton, Rob
dc.contributor.authorVasconi, M.
dc.contributor.authorSevergnini, E.
dc.contributor.authorHenke, W.
dc.contributor.authorHohle, C.
dc.contributor.authorHenry, D.
dc.contributor.authorThony, Ph.
dc.contributor.authorSchiavone, P.
dc.contributor.authorFuard, D.
dc.date.accessioned2021-10-15T04:48:21Z
dc.date.available2021-10-15T04:48:21Z
dc.date.issued2003-08
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7616
dc.sourceIIOimport
dc.titleStatus of UV2 Litho project : Usable Vacuum Ultra Violet Lithography
dc.typeMeeting abstract
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorHermans, Jan
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.source.peerreviewno
dc.source.conference4th International Symposium on 157nm Lithography
dc.source.conferencedate25/08/2003
dc.source.conferencelocationYokohama Japan
imec.availabilityPublished - imec


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