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Porosity in plasma enhanced chemical vapor deposited SiCOH dielectrics: a comparative study

dc.contributor.authorGrill, A.
dc.contributor.authorPatel, V.
dc.contributor.authorRodbell, K.P.
dc.contributor.authorHuang, E.
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorMoguilnikov, Konstantin
dc.contributor.authorToney, M.
dc.contributor.authorKim, H.C.
dc.date.accessioned2021-10-15T04:50:40Z
dc.date.available2021-10-15T04:50:40Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7629
dc.sourceIIOimport
dc.titlePorosity in plasma enhanced chemical vapor deposited SiCOH dielectrics: a comparative study
dc.typeJournal article
dc.source.peerreviewno
dc.source.beginpage3427
dc.source.endpage3435
dc.source.journalJournal of Applied Physics
dc.source.issue5
dc.source.volume94
imec.availabilityPublished - imec


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