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Determination of metallic contaminants on Ge wafers using direct- and droplet sandwich etch- total reflection X-ray fluorescence spectrometry

dc.contributor.authorHellin, David
dc.contributor.authorBearda, Twan
dc.contributor.authorZhao, Chao
dc.contributor.authorRaskin, G.
dc.contributor.authorMertens, Paul
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.contributor.authorVinckier, Chris
dc.date.accessioned2021-10-15T04:53:12Z
dc.date.available2021-10-15T04:53:12Z
dc.date.issued2003-12
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7644
dc.sourceIIOimport
dc.titleDetermination of metallic contaminants on Ge wafers using direct- and droplet sandwich etch- total reflection X-ray fluorescence spectrometry
dc.typeJournal article
dc.contributor.imecauthorHellin, David
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage2093
dc.source.endpage2104
dc.source.journalSpectrochim. Acta B
dc.source.issue12
dc.source.volume58
imec.availabilityPublished - open access
imec.internalnotes9th Symp. Total Reflection X-Ray Analysis and Related Methods; Madeira, Portugal; Sept. 2002


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