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Scaling of high-k dielectrics towards sub-1nm EOT

dc.contributor.authorHeyns, Marc
dc.contributor.authorBeckx, Stephan
dc.contributor.authorBender, Hugo
dc.contributor.authorBlomme, Pieter
dc.contributor.authorBoullart, Werner
dc.contributor.authorBrijs, Bert
dc.contributor.authorCarter, Richard
dc.contributor.authorCaymax, Matty
dc.contributor.authorClaes, Martine
dc.contributor.authorConard, Thierry
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorDegraeve, Robin
dc.contributor.authorDelabie, Annelies
dc.contributor.authorDeweerd, Wim
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorHenson, Kirklen
dc.contributor.authorKauerauf, Thomas
dc.contributor.authorKubicek, Stefan
dc.contributor.authorLucci, Luca
dc.contributor.authorLujan, Guilherme
dc.contributor.authorMentens, Jimmy
dc.contributor.authorPantisano, Luigi
dc.contributor.authorPetry, Jasmine
dc.contributor.authorRichard, Olivier
dc.contributor.authorRöhr, Erika
dc.contributor.authorSchram, Tom
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorVan Doorne, Patrick
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorWestlinder, Jörgen
dc.contributor.authorWitters, Thomas
dc.contributor.authorZhao, Chao
dc.contributor.authorCartier, Eduard
dc.contributor.authorChen, Jerry
dc.contributor.authorCosnier, Vincent
dc.contributor.authorGreen, Martin
dc.contributor.authorJang, Se Aug
dc.contributor.authorKaushik, Vidya
dc.contributor.authorKerber, Andreas
dc.contributor.authorKluth, Jon
dc.contributor.authorLin, Steven
dc.contributor.authorTsai, Wilman
dc.contributor.authorYoung, Edward
dc.contributor.authorManabe, Yukiko
dc.contributor.authorShimamoto, Yasuhiro
dc.contributor.authorBajolet, Philippe
dc.contributor.authorDe Witte, Hilde
dc.contributor.authorMaes, Jan
dc.contributor.authorDate, Lucien
dc.contributor.authorPique, Didier
dc.contributor.authorCoenegrachts, Bart
dc.contributor.authorVertommen, Johan
dc.contributor.authorPassefort, Sophie
dc.date.accessioned2021-10-15T04:54:20Z
dc.date.available2021-10-15T04:54:20Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7649
dc.sourceIIOimport
dc.titleScaling of high-k dielectrics towards sub-1nm EOT
dc.typeProceedings paper
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorBeckx, Stephan
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorBlomme, Pieter
dc.contributor.imecauthorBoullart, Werner
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorDegraeve, Robin
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.imecauthorKubicek, Stefan
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorWitters, Thomas
dc.contributor.imecauthorMaes, Jan
dc.contributor.imecauthorDate, Lucien
dc.contributor.imecauthorCoenegrachts, Bart
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.source.peerreviewno
dc.source.beginpage251
dc.source.endpage254
dc.source.conferenceIEEE International Symposium on VLSI Technology, Systems, and Applications
dc.source.conferencedate23/04/2003
dc.source.conferencelocationHsinchu Taiwan
imec.availabilityPublished - imec


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