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Determination of the H-passivation build-up time in DHF treatments

dc.contributor.authorMeuris, Marc
dc.contributor.authorIzumi, H.
dc.contributor.authorKubo, K.
dc.contributor.authorOjima, S.
dc.contributor.authorOhmi, T.
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-09-29T13:11:17Z
dc.date.available2021-09-29T13:11:17Z
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/765
dc.sourceIIOimport
dc.titleDetermination of the H-passivation build-up time in DHF treatments
dc.typeProceedings paper
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage444
dc.source.endpage448
dc.source.conferenceProceedings of the 4th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
dc.source.conferencedate9/10/1995
dc.source.conferencelocationChicago, IL USA
imec.availabilityPublished - open access
imec.internalnotesElectrochemical Society Proceedings; Vol. 95-20


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