Publication:

Implementation of 248nm based CD metrology for advanced reticle production

Date

2003

Proceedings Paper

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Author(s)

;

Grimshaw, Anthony

;

Scheuring, Gerd

;

Gittinger, Christian

;

Doebereiner, Stefan

;

;

Brueck, Hans-Juergen

;

;

Ordynskyy, Volodymyr

;

;

Chen, Shiuh-Bin

;

;

Jonckheere, Rik

;

Philipsen, Vicky

;

Schaetz, Thomas

;

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