Implementation of 248nm based CD metrology for advanced reticle production

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Authors
Hourd, Andrew; Grimshaw, Anthony; Scheuring, Gerd; Gittinger, Christian; Doebereiner, Stefan; Hillman, Frank; Brueck, Hans-Juergen; Hartmann, Hans; Ordynskyy, Volodymyr; Peter, Kai; Chen, Shiuh-Bin; Chen, Parkson; Jonckheere, Rik; Philipsen, Vicky; Schaetz, Thomas; Sommer, Karl
Conference
19th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Title
Implementation of 248nm based CD metrology for advanced reticle production
Publication type
Proceedings paper
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