dc.contributor.author | Houssiau, L. | |
dc.contributor.author | Vitchev, R.G. | |
dc.contributor.author | Conard, Thierry | |
dc.contributor.author | Vandervorst, Wilfried | |
dc.contributor.author | Bender, Hugo | |
dc.date.accessioned | 2021-10-15T04:57:24Z | |
dc.date.available | 2021-10-15T04:57:24Z | |
dc.date.issued | 2003 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/7667 | |
dc.source | IIOimport | |
dc.title | Tof-SIMS depth profiling of Hf and Al composition variations in ultrathin mixed HfO2/Al2O3 oxides | |
dc.type | Oral presentation | |
dc.contributor.imecauthor | Conard, Thierry | |
dc.contributor.imecauthor | Vandervorst, Wilfried | |
dc.contributor.imecauthor | Bender, Hugo | |
dc.contributor.orcidimec | Conard, Thierry::0000-0002-4298-5851 | |
dc.source.peerreview | no | |
dc.source.conference | International Conference on Secondary Ion Mass Spectrometry - SIMS XIV | |
dc.source.conferencedate | 14/09/2003 | |
dc.source.conferencelocation | San Diego, CA USA | |
imec.availability | Published - imec | |