dc.contributor.author | Iacopi, Francesca | |
dc.contributor.author | Patz, Michael | |
dc.contributor.author | Vos, Ingrid | |
dc.contributor.author | Tokei, Zsolt | |
dc.contributor.author | Sijmus, Bram | |
dc.contributor.author | Le, Quoc Toan | |
dc.contributor.author | Sleeckx, Erik | |
dc.contributor.author | Eyckens, Brenda | |
dc.contributor.author | Struyf, Herbert | |
dc.contributor.author | Das, Arabinda | |
dc.contributor.author | Maex, Karen | |
dc.date.accessioned | 2021-10-15T04:58:59Z | |
dc.date.available | 2021-10-15T04:58:59Z | |
dc.date.issued | 2003 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/7676 | |
dc.source | IIOimport | |
dc.title | Impact of LKD5109 low-k to cap/liner interfaces in single damascene process and performance | |
dc.type | Journal article | |
dc.contributor.imecauthor | Vos, Ingrid | |
dc.contributor.imecauthor | Tokei, Zsolt | |
dc.contributor.imecauthor | Le, Quoc Toan | |
dc.contributor.imecauthor | Sleeckx, Erik | |
dc.contributor.imecauthor | Struyf, Herbert | |
dc.contributor.imecauthor | Maex, Karen | |
dc.contributor.orcidimec | Le, Quoc Toan::0000-0002-0206-6279 | |
dc.contributor.orcidimec | Sleeckx, Erik::0000-0003-2560-6132 | |
dc.source.peerreview | no | |
dc.source.beginpage | 293 | |
dc.source.endpage | 301 | |
dc.source.journal | Microelectronic Engineering | |
dc.source.issue | 2_4 | |
dc.source.volume | 70 | |
imec.availability | Published - imec | |
imec.internalnotes | Materials for Advanced Metallization 2003 | |