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Characterization of porous structure in ultra-low-k dielectrics by depositing thin conductive cap layers

dc.contributor.authorIacopi, Francesca
dc.contributor.authorTokei, Zsolt
dc.contributor.authorStucchi, Michele
dc.contributor.authorBrongersma, Sywert
dc.contributor.authorVanhaeren, Danielle
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-15T04:59:10Z
dc.date.available2021-10-15T04:59:10Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7677
dc.sourceIIOimport
dc.titleCharacterization of porous structure in ultra-low-k dielectrics by depositing thin conductive cap layers
dc.typeJournal article
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorStucchi, Michele
dc.contributor.imecauthorBrongersma, Sywert
dc.contributor.imecauthorVanhaeren, Danielle
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecBrongersma, Sywert::0000-0002-1755-3897
dc.contributor.orcidimecVanhaeren, Danielle::0000-0001-8624-9533
dc.source.peerreviewno
dc.source.beginpage123
dc.source.endpage131
dc.source.journalMicroelectronic Engineering
dc.source.issue1_2
dc.source.volume65
imec.availabilityPublished - imec


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