Creation and dissolution of oxygen related defects in czochralski grown silicon treated at high pressures - high temperatures
dc.contributor.author | Misiuk, A. | |
dc.contributor.author | Vanhellemont, Jan | |
dc.contributor.author | Claeys, Cor | |
dc.contributor.author | Hartwig, J. | |
dc.contributor.author | Prieur, E. | |
dc.contributor.author | Datsenko, L. | |
dc.contributor.author | Khrupa, V. | |
dc.contributor.author | Antonova, I. V. | |
dc.contributor.author | Bak-Misiuk, J. | |
dc.date.accessioned | 2021-09-29T13:11:27Z | |
dc.date.available | 2021-09-29T13:11:27Z | |
dc.date.issued | 1995 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/768 | |
dc.source | IIOimport | |
dc.title | Creation and dissolution of oxygen related defects in czochralski grown silicon treated at high pressures - high temperatures | |
dc.type | Proceedings paper | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 328 | |
dc.source.endpage | 331 | |
dc.source.conference | Applied Crystallography. Proceedings of the XVI Conference | |
dc.source.conferencedate | 22/08/1994 | |
dc.source.conferencelocation | Cieszyn Poland | |
imec.availability | Published - open access |