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Feature proximity errors on mask: assessment results of commercially obtained reticles

dc.contributor.authorJonckheere, Rik
dc.contributor.authorPotoms, Goedele
dc.contributor.authorPhilipsen, Vicky
dc.date.accessioned2021-10-15T05:04:16Z
dc.date.available2021-10-15T05:04:16Z
dc.date.issued2003-01
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7705
dc.sourceIIOimport
dc.titleFeature proximity errors on mask: assessment results of commercially obtained reticles
dc.typeProceedings paper
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorPotoms, Goedele
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.source.peerreviewno
dc.source.beginpage128
dc.source.endpage137
dc.source.conference19th European Conference on Mask Technology for Integrated Circuits and Microcomponents
dc.source.conferencedate13/01/2003
dc.source.conferencelocationSonthofen Duitsland
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol 5148


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