Reticle terminology and metrology needs for advanced 193nm and 157nm lithography

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Authors
Jonckheere, Rik; Ronse, Kurt; Philipsen, Vicky; Leunissen, Peter
Conference
PTB Seminar "CD Metrology"
Title
Reticle terminology and metrology needs for advanced 193nm and 157nm lithography
Publication type
Oral presentation
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