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Ni- and Co-based silicides for advanced CMOS applications

dc.contributor.authorKittl, Jorge
dc.contributor.authorLauwers, Anne
dc.contributor.authorChamirian, Oxana
dc.contributor.authorVan Dal, Mark
dc.contributor.authorAkheyar, Amal
dc.contributor.authorde Potter de ten Broeck, Muriel
dc.contributor.authorLindsay, Richard
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-15T05:11:07Z
dc.date.available2021-10-15T05:11:07Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7740
dc.sourceIIOimport
dc.titleNi- and Co-based silicides for advanced CMOS applications
dc.typeJournal article
dc.contributor.imecauthorLauwers, Anne
dc.contributor.imecauthorVan Dal, Mark
dc.contributor.imecauthorde Potter de ten Broeck, Muriel
dc.contributor.imecauthorMaex, Karen
dc.source.peerreviewno
dc.source.beginpage158
dc.source.endpage165
dc.source.journalMicroelectronic Engineering
dc.source.issue2_4
dc.source.volume70
imec.availabilityPublished - imec
imec.internalnotesMaterials for Advanced Metallization 2003


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